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Photoresist & Photoresist Ancillaries Market worth $5.3 billion by 2028 – At a CAGR of 5.1%

Published: September 5, 2023
Author: TEXTILE VALUE CHAIN

The According to a market research report, the Photoresist & Photoresist Ancillaries Market by Photoresist Type (ArF Immersion, ArF Dry Film, KrF, G-line & I-line), Ancillary Type (Anti-reflective Coating, Remover, Developer), Application (Semiconductor & IC, LCD, ), Region – Global Forecast to 2028″, is approximated to be USD 4.1 billion in 2023, and it is projected to reach USD 5.3 billion by 2028, at a CAGR of 5.1%.

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  • 199 Market data Tables
  • 44 Figures
  • 207 Pages and in-depth TOC on “Photoresist & Photoresist Ancillaries Market – Global Forecast to 2028”

Photoresists are light-sensitive materials used in the semiconductor and microelectronics industries to precisely pattern and etch substrates during the manufacturing of integrated circuits and electronic devices. These materials undergo a chemical change upon exposure to light, enabling accurate pattern transfer. Photoresist ancillaries are complementary materials and chemicals used in conjunction with photoresists to optimize the lithographic process. Antireflective coating, developer, and remover are some of the types of photoresist ancillaries that are majorly used during photolithography.

This report also provides a comprehensive analysis of the companies listed below:

The photoresist and photoresist ancillaries market comprise of major players such as Tokyo Ohka Kogyo Co., Ltd (Japan), JSR Corporation (Japan), Shin-Etsu Chemical Co., Ltd (Japan), Fujifilm Corporation (Japan), Sumitomo Chemical Co., Ltd. (Japan), and others. Expansions, acquisitions, joint ventures, and new product developments are some of the major strategies adopted by these key players to enhance their positions in the photoresist and photoresist ancillaries market.

Recent Developments in Photoresist & Photoresist Ancillaries Market

  • In August 2022, JSR Corporation signed an investment agreement for the establishment of a subsidiary in the area of Shanghai. This is done to strengthen JSR Group’s business operations in the Chinese market regarding semiconductor materials.
  • In September 2021, JSR Corporation launched a subsidiary in Singapore called “JSR Electronic Materials Singapore Pte. Ltd.” in order to boost the sales and marketing efforts of the semiconductor materials business in Singapore and Southeast Asia. With the creation of the subsidiary, the company will improve its   regional marketing and customer service skills in Southeast Asia, which will result in an increase in the client and product base.
  • In October 2020, The Tokyo-based Shin-Etsu Chemical Co., Ltd., announced plans to invest 30 billion yen (USD 280 million) in new facilities at its manufacturing facilities for photoresists in Taiwan and Japan. Shin-Etsu will keep investing in facilities to keep up with the rising demand for photoresists, which are crucial in the production of cutting-edge semiconductors.
  • In July 2020, TOK advanced materials have started the production of extreme ultraviolet (EUV) in its facility at Songdo, Incheon, South Korea. The step has been taken to serve Samsung electronics as it has increased the use of EUV-based lithography for chip production.

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Positive and negative photoresists are two types of light-sensitive materials used in the semiconductor and microelectronics industries for lithographic processes. A positive resist is a kind of photoresist in which the exposed area of the photoresist becomes soluble in the developer. The photoresist developer cannot dissolve the photoresist that has not been exposed. A negative photoresist is a type of photoresist in which the portion that is exposed to light becomes insoluble in the photoresist developer. The photoresist developer dissolves the unexposed portion of the photoresist.
The photoresist and photoresist ancillaries market can be segmented based on its response to a specific wavelength of light. These materials are sensitive to wavelengths 193 nm (ArF), 248 nm (KrF), 365 nm (I-line), and 436 nm (G-line). ArF is the most widely used as it provides low defect levels with superior resolution, owing to its narrow wavelength and ability to break through a 10 nm level.

The photoresist and photoresist ancillaries market is divided into different applications like semiconductor &ICs, LCD, printed circuit boards, and others (NEMS, MEMS, sensors). In the production of semiconductors and integrated circuits (IC), photoresists are essential. On the surface of semiconductor substrates, they are utilized to define the circuitry and produce detailed designs. Semiconductors & ICs segment is the largest application due to the production of huge volumes of integrated circuits or chips.

The photoresist and photoresist ancillaries market is studied for five regions, namely, North America, Europe, Asia Pacific, the Middle East & Africa, and South America. Asia Pacific is the largest consumer of photoresist and photoresist ancillaries globally.  The Asia Pacific region has witnessed significant growth in the semiconductor industry, with the proliferation of consumer electronics, automotive electronics, and industrial automation. This growth is fueled by factors such as rising disposable incomes, increasing adoption of smart devices, and expanding digital infrastructure. Asia Pacific is expected to be the fastest-growing regional market also due to the growing chip production in Taiwan, China, Japan, and South Korea.

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